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    ASIA unversity > 資訊學院 > 資訊工程學系 > 期刊論文 >  Item 310904400/108630

    Please use this identifier to cite or link to this item: http://asiair.asia.edu.tw/ir/handle/310904400/108630

    Title: Antireflection coating of SiO2 thin film in dye-sensitized solar cell prepared by liquid phase deposition
    Authors: 陳兆南;CHAO-NAN,CHEN;吳孟軍;Menq-Jion,Wu;徐俊發;Chun-Fa,Hsu;黃俊杰;Jung-Jie,Huang
    Contributors: 資訊工程學系
    Date: 2017-01
    Issue Date: 2017-12-08 14:48:40 (UTC+8)
    Abstract: In this study, we present a simple method for producing SiO2 antireflection (AR) coatings functionalized photoanodes by liquid phase deposition (LPD) using a deposition solution of hydrofluosilicic acid (H2SiF6) and boric acid (H3BO3). Antireflection coatings are used in dye-sensitized solar cells (DSSCs) to grad the reflective index between the glass and air interface. The less refractive index of the LPD-SiO2 coating also helps to improve the transmittance of the AR coating. This paper presents a detailed study obtained of DSSCs, with and without this LPD-SiO2 AR coating. Measurements show a short current density gain of 25.39%. The DSSC efficiency was improved from 4.76 to 6.03% with the LPD-SiO2 AR coating.
    Appears in Collections:[資訊工程學系] 期刊論文

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