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    ASIA unversity > 資訊學院 > 光電與通訊學系 > 會議論文 >  Item 310904400/76580


    Please use this identifier to cite or link to this item: http://asiair.asia.edu.tw/ir/handle/310904400/76580


    Title: Effects of Oxygen Pressure and Post-Deposition Annealing on the Characteristics of Pulsed Laser Deposited High-k Dielectric LaAlO3 Films on Indium Tin Oxide Films
    Authors: 蔡宗叡;TSAI, JUNG-RUEY;林文凱;Lin, Wen-Kai;馮文生;Feng, Wen-Sheng;劉國辰;Liu, Kou-Chen
    Contributors: 光電與通訊學系
    Date: 2012.07
    Issue Date: 2013-12-26 13:23:27 (UTC+8)
    Relation: ThinFilm 2012
    Appears in Collections:[光電與通訊學系] 會議論文

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