ASIA unversity:Item 310904400/79756
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 90587/105803 (86%)
造访人次 : 16748991      在线人数 : 31
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 查询小技巧:
  • 您可在西文检索词汇前后加上"双引号",以获取较精准的检索结果
  • 若欲以作者姓名搜寻,建议至进阶搜寻限定作者字段,可获得较完整数据
  • 进阶搜寻
    ASIA unversity > 管理學院 > 國際企業學系 > 期刊論文 >  Item 310904400/79756


    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://asiair.asia.edu.tw/ir/handle/310904400/79756


    题名: An Accurate Prediction for as-Implanted Doping Profile Calibration Using Different Ion Implantation
    作者: Vivek;Vivek;pradahana;pradahana;許健;Sheu, Gene;王俊博;Subramaya;Subramaya;Amanullah;Amanullah;Sharma;Sharma;楊紹明;Yang, Shao-Ming
    贡献者: 資訊工程學系
    日期: 2014-05
    上传时间: 2014-06-05 12:04:01 (UTC+8)
    摘要: The simulation tool is very important to develop process and design a new device structures. Device characteristics and physics phenomena also can be analyzed and predicted using this tool. But, it also have the limitation such us the physical model to describe the nature behaviours accurately. Selecting the models should be defined correctly. One of the critical processes is ion implantation because it is important to make a junction and determine the breakdown. For getting accurate results, the doping concentration profile in simulation should be calibrated with experiment, like Secondary Ion Mass Spectrometry (SIMS) profile. In this paper, Taurus analytical and Monte Carlo ion implantation model was investigated. The calibration will be difficult by using Taurus Analytical default Model. Using Taurus model by calibrating parameter can give a good agreement SIMS. Monte Carlo ion implantation model generally can give good profile prediction without calibration.
    關聯: 2014 IEEE 8th International Power Engineering and Optimization Conference ;PEOCO2014), Langkawi, The Jewel of Kedah,
    显示于类别:[國際企業學系] 期刊論文

    文件中的档案:

    档案 大小格式浏览次数
    index.html0KbHTML632检视/开启


    在ASIAIR中所有的数据项都受到原著作权保护.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回馈