English  |  正體中文  |  简体中文  |  Items with full text/Total items : 90453/105671 (86%)
Visitors : 15996548      Online Users : 202
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version
    ASIA unversity > 資訊學院 > 資訊工程學系 > 期刊論文 >  Item 310904400/96008


    Please use this identifier to cite or link to this item: http://asiair.asia.edu.tw/ir/handle/310904400/96008


    Title: Negative e-beam resists using for nano-imprint lithography and silicone mold fabrication
    Authors: Anil Kumar, (Anil Kumar, T.V.);Shy, S.L(Shy, S.L);Sheu), 許健(Gene;Yang), 楊紹明(Shao-Ming;Chen, M.C.(Chen, M.C.);Hong, C.S.(Hong, C.S.)
    Contributors: 資訊工程學系
    Date: 2015-03
    Issue Date: 2015-12-11 13:48:39 (UTC+8)
    Relation: Proceedings of SPIE - The International Society for Optical Engineering
    Appears in Collections:[資訊工程學系] 期刊論文

    Files in This Item:

    There are no files associated with this item.



    All items in ASIAIR are protected by copyright, with all rights reserved.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback